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SOLEMS is high tech 100% french and independant SME with more than 26 years experience in manufacturing thin film silicon solar cells, modules and sensors<\/strong> and technical partnership in the low-power\u00a0<\/strong>photovoltaic off-grid systems<\/strong> for professionals. Thin film related services are also in its portfolio.<\/p>\n YOUR PARTNER TO IMPLEMENT SOLAR ENERGY<\/span><\/strong> IN YOUR PRODUCTS<\/span><\/strong><\/p>\n Location<\/strong>: France, Palaiseau city (91), south of Paris, 15 kms away, near Orsay University and Ecole Polytechnique. [\/vc_column_text][\/vc_column][\/vc_row][vc_row][vc_column][vc_empty_space height=”30px”] [\/vc_column_text][\/vc_column_inner][vc_column_inner width=”1\/3″][vc_empty_space height=”15px”][vc_single_image image=”1890″ img_size=”full” alignment=”center”][\/vc_column_inner][\/vc_row_inner][vc_empty_space height=”30px”]
\nSales area<\/strong> : Worldwide
\nCustomers<\/strong> : SMEs as well as big companies<\/p>\nSOLEMS history : the milestones<\/h2><\/div>[vc_empty_space height=”15px”][vc_row_inner][vc_column_inner width=”2\/3″][vc_column_text]<\/p>\n
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\n 1981<\/strong><\/td>\n Solems was founded by Ionel Solomon, research director in Ecole Polytechnique (Palaiseau), later member of the french Science Academy.<\/td>\n<\/tr>\n \n 1986<\/strong><\/td>\n PLASMA BOX patent for amorphous silicon coatings<\/td>\n<\/tr>\n \n 1988-1993<\/strong><\/td>\n Germano-french joint venture PHOTOTRONICS<\/td>\n<\/tr>\n \n 1993<\/strong><\/td>\n A group of SOLEMS employees buys out the partnership to develop customer specific solar energy and light detection<\/td>\n<\/tr>\n \n 2003<\/strong><\/td>\n A cash flow of 1 Meuros is reached<\/td>\n<\/tr>\n \n 2005-2008<\/strong><\/td>\n Start of ATOS project, with LPICM in Ecole Polytechnique, TOTAL, Saint Gobain and few other labs, for the scale-up of polymorphous silicon<\/td>\n<\/tr>\n \n 2010-2013<\/strong><\/td>\n Collaboration with SOLSIA\u00a0start-up company, to develop SPLIT panels, result of ATOS project<\/td>\n<\/tr>\n \n 2013<\/strong><\/td>\n Implementation of the new generation PECVD reactor for the production of polymorphous and microcrystalline silicon devices.<\/td>\n<\/tr>\n \n 2018<\/strong><\/td>\n New\u00a0C.E.O.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n Team<\/h2><\/div>[vc_empty_space height=”30px”][\/vc_column][\/vc_row][vc_row][vc_column width=”1\/2″][vc_single_image image=”2389″ img_size=”3000 x 1500″ alignment=”center”][\/vc_column][vc_column width=”1\/2″][vc_row_inner][vc_column_inner width=”1\/2″]\r\n\t\t