{"id":1478,"date":"2016-07-27T15:25:53","date_gmt":"2016-07-27T13:25:53","guid":{"rendered":"https:\/\/www.solems.com\/en\/?page_id=1478"},"modified":"2016-09-27T14:17:57","modified_gmt":"2016-09-27T12:17:57","slug":"thin-film-deposition","status":"publish","type":"page","link":"https:\/\/www.solems.com\/en\/thin-film-deposition","title":{"rendered":"Thin film deposition"},"content":{"rendered":"<p>[vc_row][vc_column]<div class=\"ind-title-wrap\"><h2 style=\"\" class=\"ind-title\">Amorphous and polymorphous silicon<\/h2><\/div>[vc_empty_space height=&#8221;15px&#8221;][vc_column_text]<strong>Thin film silicon coating by PECVD* from silane (SiH4) :<\/strong><\/p>\n<ul>\n<li>A moderate temperature process 150-250\u00b0C<\/li>\n<li>High quality thin films are produced : hydrognated amorphous silicon, polymorphous, microcristalline, doped or intrinsic, silicon-carbon and silicon-germanium alloys &#8230;<\/li>\n<li>Necessary to get semiconducting properties, hydrogen is naturally incorporated by this technique<\/li>\n<li>It is self-cleaning by plasma etching of the reactors<\/li>\n<\/ul>\n<p>* PECVD = Plasma Enhanced Chemical Vapor Deposition<\/p>\n<p>SOLEMS process for silicon p-i-n components : solar cells, modules and sensors.<\/p>\n<table>\n<tbody>\n<tr>\n<td><a href=\"https:\/\/www.solems.com\/wp-content\/uploads\/Process_en.pdf\" target=\"_blank\">More in SOLEMS manufacturing process<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<p><strong>Available in SOLEMS on 300 x 300 mm sheets :<\/strong><\/p>\n<ul>\n<li>a-Si:H intrinsic, p-type or n-type<\/li>\n<li>a-SiC:H p-type<\/li>\n<li>stacked layers p-i-n for example &lt;1\u00b5m<\/li>\n<\/ul>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter wp-image-998 size-full\" src=\"https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf.jpg\" alt=\"bati_PECVD-vf\" width=\"600\" height=\"448\" srcset=\"https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf.jpg 600w, https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf-300x224.jpg 300w, https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf-409x305.jpg 409w, https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf-555x414.jpg 555w, https:\/\/www.solems.com\/wp-content\/uploads\/bati_PECVD-vf-471x352.jpg 471w\" sizes=\"auto, (max-width: 600px) 100vw, 600px\" \/><\/p>\n<p><a href=\"https:\/\/www.solems.com\/en\/contact\">Apply to us<\/a> for any request.[\/vc_column_text][vc_empty_space height=&#8221;30px&#8221;]<div class=\"ind-title-wrap\"><h2 style=\"\" class=\"ind-title\">Metallic coatings<\/h2><\/div>[vc_empty_space height=&#8221;15px&#8221;][vc_column_text]for metallic coatings is :<\/p>\n<ul>\n<li>A low temperature process (&lt; 80\u00b0C) compatible with many substrates<\/li>\n<li>A high speed coating<\/li>\n<li>Very energetic and dense<\/li>\n<li>Compatible with lots of metallic materials<\/li>\n<\/ul>\n<p><strong>Available in SOLEMS :<\/strong><\/p>\n<ul>\n<li>Aluminium \/ Ti 1%<\/li>\n<li>Nickel<\/li>\n<\/ul>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter wp-image-1004 size-full\" src=\"https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf.jpg\" alt=\"cibles_metalliques-vf\" width=\"600\" height=\"443\" srcset=\"https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf.jpg 600w, https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf-300x222.jpg 300w, https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf-409x302.jpg 409w, https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf-555x410.jpg 555w, https:\/\/www.solems.com\/wp-content\/uploads\/cibles_metalliques-vf-471x348.jpg 471w\" sizes=\"auto, (max-width: 600px) 100vw, 600px\" \/><\/p>\n<p><a href=\"https:\/\/www.solems.com\/en\/oxydes-transparents-conducteurs\"><em>See also Transparent conductive substrates<\/em><\/a>[\/vc_column_text][vc_empty_space height=&#8221;30px&#8221;]<div class=\"ind-title-wrap\"><h2 style=\"\" class=\"ind-title\">Laser patterning<\/h2><\/div>[vc_empty_space height=&#8221;15px&#8221;][vc_column_text]<em>Patterning, etching, isolation of conductive thin films, grooves in silicon layers for contacting &#8230;<\/em><\/p>\n<p><strong>4 etching-lasers are available in SOLEMS :<\/strong><\/p>\n<ul>\n<li>2 <strong>YAG 1.064\u00b5m<\/strong> lasers with Q-switch (<strong>pulsed lasers<\/strong>) supplying short pulses of power for selective etching of oxides layers : SnO2, ITO, ZnO &#8230;etc&#8230;<\/li>\n<li>2 <strong>double-frequency YAG<\/strong> lasers (532nm) also pulsed for silicon films etching.<\/li>\n<\/ul>\n<p>The <strong>optical fiber<\/strong> driving the laser power is placed on a X-Y table moving tool. The patterning drawn on the thin films is therefore entirely programmable.[\/vc_column_text][vc_row_inner css=&#8221;.vc_custom_1468324882696{margin-top: 30px !important;margin-bottom: 30px !important;}&#8221;][vc_column_inner width=&#8221;1\/2&#8243;][vc_single_image image=&#8221;1007&#8243; img_size=&#8221;medium&#8221; alignment=&#8221;center&#8221;][\/vc_column_inner][vc_column_inner width=&#8221;1\/2&#8243;][vc_single_image image=&#8221;1006&#8243; img_size=&#8221;medium&#8221; alignment=&#8221;center&#8221;][\/vc_column_inner][\/vc_row_inner][\/vc_column][\/vc_row][vc_row][vc_column][vc_column_text]It is a sublimation process : the material is removed from its substrate, directly transformed into vapor by the heat generated by the laser pulse. By tuning the laser intensity, the Q-switch frequency, the tool speed, it is possible to get either a continuous isolation line, or separate spots, for example to perform a top-bottom electrical contact through a layer.<\/p>\n<p>This technique is namely used to :<\/p>\n<ul>\n<li>isolate conductive areas on a TCO (transparent conducting oxide)<\/li>\n<li>cut very hard ceramic layers without contact<\/li>\n<li>ensure the series connection of neighbouring cells on a thin film solar cell or module by contacting metal (-) and TCO (+) of the 2 cells through the holes made by laser in the silicon layer<\/li>\n<\/ul>\n<p><em>Concerning the use of this process in SOLEMS products, see :<\/em><\/p>\n<table>\n<tbody>\n<tr>\n<td><a href=\"https:\/\/www.solems.com\/wp-content\/uploads\/Process_en.pdf\" target=\"_blank\">SOLEMS manufacturing process<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<p><a href=\"https:\/\/www.solems.com\/en\/contact\">Apply to us<\/a> for any request.[\/vc_column_text][\/vc_column][\/vc_row]<\/p>\n","protected":false},"excerpt":{"rendered":"<p>[vc_row][vc_column][vc_empty_space height=&#8221;15px&#8221;][vc_column_text]Thin film silicon coating by PECVD* from silane (SiH4) : A moderate temperature process 150-250\u00b0C High quality thin films are produced : hydrognated amorphous silicon, polymorphous, microcristalline, doped or intrinsic, silicon-carbon and silicon-germanium alloys &#8230; Necessary to get semiconducting properties, hydrogen is naturally incorporated by this technique It is self-cleaning by plasma etching of [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"page-tpl_full_width.php","meta":{"footnotes":""},"class_list":["post-1478","page","type-page","status-publish","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v26.8 - 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